Work

Robust Emission of Dark Trions in WS2/WSe2 Heterostructure

Year: 2025

Type: article

Source: Nano Letters

DOI: 10.1021/acs.nanolett.5c02798

Authors: Yue Hu, Jingwen Chen, Ruoxuan Xing, Dehui Li, Xinglin Wen

Institutions: Huazhong University of Science and Technology, Wuhan National Laboratory for Optoelectronics

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Huazhong University of Science and Technology, National Key Research and Development Program of China

Award: G3100860838

OpenAlex ID: W4414495668

FWCI: 0.207

Cites: 57

Cited by: 1

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