Work

Effect of Networking Density on the Patterning Performance of Molecular Layer Deposited Alucone Electron Beam/EUV Resists

Year: 2025

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.5c13361

Authors: Long Viet Than, Giulio D’Acunto, Maggy Harake, Honggu Im, Oleg Kostko, Stacey F. Bent

Institutions: Stanford University, Lawrence Berkeley National Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Knut och Alice Wallenbergs Stiftelse, Basic Energy Sciences

Award: G4520758489

OpenAlex ID: W4414533932

FWCI: 2.279

Cites: 65

Cited by: 10

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