Work

Mechanistic Insights into Acid Generation from Nonionic Photoacid Generators for Extreme Ultraviolet and Electron Beam Lithography

Year: 2025

Type: article

Source: The Journal of Physical Chemistry A

DOI: 10.1021/acs.jpca.5c05089

Authors: Chengbin Fu, Jie Xue, Hanshen Xin, Jianhua Zhang, Haoyuan Li

Institution: Shanghai University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G1247919807, G8301053631

OpenAlex ID: W4414535572

FWCI: 0.231

Cites: 47

Cited by: 1

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