Work

Macro and Micro-Scale Non-Contact Imaging of Electrically Active Extended Defects in 4H-SiC Merged PiN Schottky Diode Devices

Year: 2025

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2025.3614854

Authors: Firas Faisal, Nils Steller, Robin Karhu, Birgit Kallinger, Gennadi Polisski, Marshall Wilson, Alexandre Savtchouk, Liliana Gutierrez, Carlos Almeida, Cordero Soto, Bradley Wilson, Dmitriy Marinskiy, Adam Wincukiewicz, Jacek Lagowski

Institution: Fraunhofer Institute for Integrated Systems and Device Technology

Language: English

Topic: Integrated Circuits and Semiconductor Failure Analysis

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414538286

FWCI: 0.231

Cites: 4

Cited by: 1

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