Work

Use of an auxiliary electrode to control plasma properties at the wafer edge in inductively coupled plasmas with a substrate bias

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004847

Authors: Tugba Piskin, Saravanapriyan Sriraman, Hyunjae Lee, Sang Ki Nam, Mark J. Kushner

Institutions: University of Michigan, Lam Research (United States), Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, U.S. Department of Energy, Lam Research, Samsung

Awards: G3098541178, G8299879601, Collaborative Research: GOALI - Nonlinear Coupling in Pulsed Electronegative Plasmas: Multiple-sources, Multiple-frequencies, Multiple-time scales

OpenAlex ID: W4414543256

FWCI: 0.462

Cites: 28

Cited by: 2

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