Work

Achieving high-accuracy and noise-robust process window analysis through stepwise regression

Year: 2025

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.24.3.034801

Authors: Fuxun Chen, Zeyang Chen, Chaoyi Zheng, Dong Ni, Dawei Gao, Guodong Zhou

Institution: Zhejiang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Zhejiang University

OpenAlex ID: W4414597374

FWCI:

Cites:

Cited by:

Related to: