Work

Evaluation of thinner resist film in beyond EUV interference lithography tool at NewSUBARU

Year: 2025

Type: conference-abstract

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.3071324

Authors: Ryuta Shiga, Shinji Yamakawa, Tetsuo Harada, Naoki Hayase

Institution: University of Hyogo

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414630209

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