Stress-Induced Directed Self-Assembly of Perpendicularly Oriented Block Copolymer Lamellae for Lithographic Density Multiplication
Year: 2025
Type: article
Abstract: reactive ion etching. This facile method enables controlled orientation of a free-standing BCP thin film by integrating vacuum-driven perpendicular orientation and stress-induced DSA, providing appealing potential for fabrication of highly ordered line patterns in advanced lithographic applications.
Institutions: National Tsing Hua University, City University of Hong Kong
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $4,500
Award: G5202477356
OpenAlex ID: W4414630363