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The Stabilization by Morphotropic Phase Boundary with a MoOx Cap on Hf1−xZrxO2 Dielectrics

Year: 2025

Type: article

Source: ECS Journal of Solid State Science and Technology

DOI: 10.1149/2162-8777/ae0db7

Authors: Ding-Yeong Wang, Kuei-Chih Lin, Cheng-Li Lin, Jer Chyi Wang, Chun-Yao Tou, Pi-Chun Juan

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Ministry of Science and Technology, Taiwan

OpenAlex ID: W4414637105

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Cites: 35

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