Work

Structure of Thin Titanium Nitride Films Deposited by Magnetron Sputtering

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.7868/s3034548025030029

Author: A. G. Isaev

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414690400

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