Reduction of interface defects in Al 2 O 3 /HfO 2 nanolaminates using ultrathin SiO 2 interlayers grown via plasma-enhanced atomic layer deposition
Year: 2025
Type: article
Abstract: Al 2 O 3 /HfO 2 nanolaminates combine the advantages of both Al 2 O 3 and HfO 2 , showing great potential in applications such as laser coatings. However, the Al 2 O 3 -on-HfO 2 interface in Al 2 O 3 /HfO 2 nanolaminates has a relatively high defect density, which can negatively affect the overall performance of associated coatings. Ultrathin SiO 2 interlayers were added at the Al 2 O 3 -on-HfO 2 interface in an Al 2 O 3 /HfO 2 nanolaminate and an Al 2 O 3 –HfO 2 nanocomposite with thinner sublayers using plasma-enhanced atomic layer deposition. The experimental results show that adding SiO 2 interlayers can reduce the interface defect density and increase the laser-induced damage threshold (LIDT) of the nanolaminate and nanocomposite without significantly affecting the refractive index. When using this Al 2 O 3 –HfO 2 –SiO 2 nanocomposite instead of HfO 2 to fabricate a plate laser beam splitter coating, the LIDT can be increased by 1.5 times. We believe that this ultrathin SiO 2 interlayer strategy may benefit other nanolaminates with high-density interface defects and contribute to enhancing the performance of high-power laser coatings.
Source: Optics Express
Authors: Zesheng Lin, Chen Song, Wenyun Du, Jianda Shao, Meiping Zhu
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $2,270
Awards: G3140209750, G8075358553
OpenAlex ID: W4414743474