Direct current and radio frequency plasma sources of titanium dioxide doped in tungsten trioxide for all-solid-state electrochromic devices
Year: 2025
Type: article
Source: Applied Optics
DOI: 10.1364/ao.574920
Authors: Hsi-Chao Chen, Ri-Jun Li, Bo-Huei Liao, Sheng-De Wong
Institution: National Institutes of Applied Research
Language: English
Subfield: Polymers and Plastics
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: Radio Frequency and High Power Impulse Magnetron Sputtering Deposit Al-Doped Spinel Limn2o4 Thin Films to Reduce Jahn-Teller Distortion for Solid-State Flexible Lithium-Ion Batteries, Deep-Oscillation Reactive Magnetron-Sputtering Carbon Doped Titanium Nitride Low-Corrosion Antistatic Hard Film in Semiconductor Fixtures
OpenAlex ID: W4414784853
