Work

Area-selective atomic/molecular layer deposition via block copolymer approach: Zn-benzene dithiol deposition as a case study

Year: 2025

Type: article

Abstract: We have developed a novel atomic/molecular layer deposition (ALD/MLD) process for the growth of essentially air-stable zinc-organic thin films from diethyl zinc and 1,4-benzene dithiol (BDT) precursors at an appreciably low deposition temperature of 60 °C. The low deposition temperature along with the high film growth rate of 3.96 Å/cycle achieved with relatively short precursor pulse lengths allowed us to employ the process for area-selective (AS) ALD/MLD on block copolymer (BCP) substrates, not challenged before. Our study showed that on the chosen polystyrene-b-poly(ethylene oxide) (PS-b-PEO) BCP substrates, the Zn-BDT film grows in an AS manner such that the growth most likely occurs preferentially on the PEO domains. We believe the BCP-based AS-ALD/MLD approach represents an alternative nanopatterning technique to the conventional photolithography, which could be highly beneficial particularly in next-generation flexible applications.

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004848

Authors: Olga Partanen, Lijo George, Anish Philip, Mauri A. Kostiainen, Maarit Karppinen

Institution: Aalto University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: hybrid

Funders: European Commission, Aalto-Yliopisto, Business Finland, European Research Council

Awards: G1541838235, G2132190419