Year: 2025
Type: article
Abstract: High Resolution Image Download MS PowerPoint Slide This study examines the lateral diffusion of hydrogen in tungsten trioxide (WO 3 ) thin films with a nickel oxide (NiO) top layer. It focuses on the impact of the depletion region formed at the NiO/WO 3 p–n heterojunction on the diffusion process. This depletion region influences diffusion by acting as a barrier to hydrogen movement. It effectively reduces the thickness in WO 3 available for diffusion and increases the diffusion velocity due to the interplay with the concentration-dependent diffusion coefficient in polycrystalline WO 3 . Our in situ measurement technique allows for the detailed study of lateral hydrogen diffusion by inducing a concentration gradient in the layer plane. This method demonstrates by a direct comparison that diffusion is faster in the WO 3 /NiO layer structure compared to the pristine WO 3 structure. This research demonstrates the technological potential of manipulating and tuning diffusion processes in electrochromic materials by incorporating them in layered structures and paves the way for more advanced applications.
Institution: Justus-Liebig-Universität Gießen
Language: English
Subfield: Polymers and Plastics
Field: Materials Science
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $4,500
Award: G2172973567
OpenAlex ID: W4414801124