Work

Scalable fabrication of CuOx/NiOx composite hole transport layer via a sequential magnetron sputtering method for efficient and stable perovskite solar cells

Year: 2025

Type: article

Abstract: Magnetron sputtering inorganic NiOx hole transport layer (HTL) has become a practical method in the industrial production of perovskite solar cells (PSCs), owing to its advantages of large-area fabrication and high process controllability. However, the relatively poor conductivity and high defect density of HTL hinder further improvements in device performance. In this work, to address the above issues of sputtered NiOx, the composite HTL of CuOx/NiOx was innovatively deposited by sequential sputtering of Cu and NiO targets with the easy industrial production. Subsequently, through the optimization of the sputtering process parameters (time, atmosphere, and annealing temperature), the composite HTL demonstrated superior photoelectric performance compared to the single NiOx. Meanwhile, the introduction of CuOx effectively reduced the defect density of the PSCs, thereby improving the carrier transport dynamics. Finally, this viable industrialization strategy boosted the PCE of MA0.85FA0.15PbI3 PSCs from 15.3% to 17.86%, which was prepared without spin-coating fragile self-assembled monolayers (SAMs) under open-air conditions, demonstrating promising potential for commercial applications.

Source: Materials Science in Semiconductor Processing

DOI: 10.1016/j.mssp.2025.110110