Estimation of the intrinsic stress of thermally-oxidized film on an Si(100) surface and the emission ratio of Si atoms
Year: 2025
Type: article
Authors: Eiji Kamiyama, Koji Sueoka
Institution: Okayama Prefectural University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4414867283