Work

Study on the mechanism of Ge thin film exfoliation induced by H and He ion implantation

Year: 2025

Type: article

Source: Physica Scripta

DOI: 10.1088/1402-4896/ae1072

Authors: Hongxu Li, Rui Huang, Yue Liang, Lei Liang, Zhiyong Wang

Institutions: Wuxi University, Beijing University of Technology

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Wuxi Municipal Bureau on Science and Technology

OpenAlex ID: W4414904192

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Cites: 41

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