Work

Effect of argon-oxygen ratios on crystallization and surface morphology of gallium oxide thin films by low-pressure chemical vapor deposition

Year: 2025

Type: conference-paper

Source: IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)

DOI: 10.1109/wipda-asia63772.2025.11183966

Authors: Zhihao Yang, Jichao Hu, Jinhui Yu, Xiaodong Yang, Xiaomin He, Bo Peng

Institutions: Xi'an University of Technology, Xidian University

Language: English

Topic: Ga2O3 and related materials

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

OpenAlex ID: W4414908869

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