Cross-Scale Synergistic Control of Multifields and Motions in Electrochemical Mechanical Polishing (ECMP) for Atomic-Scale GaN Surface
Year: 2025
Type: article
Source: Langmuir
Authors: Shengjie You, Zirui Wang, Zhao Ding, Kunpeng Guan, Tianyu Zhang, Haojie Guo, Yang Peng, Yongguang Wang, Xiaolong Lu, Chuanyang Wang
Institutions: Soochow University, Xi’an Jiaotong-Liverpool University
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4414984527