Regression analysis of temperature-dependent alumina atomic layer deposition growth per cycle using trimethylaluminum and water as precursors
Year: 2025
Type: article
DOI: 10.1116/6.0004738
Author: Raymond A. Adomaitis
Institution: University of Maryland, College Park
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4414993164