Work

Spin properties in droplet epitaxy grown telecom quantum dots

Year: 2025
Type: article
Abstract: We investigate the spin properties of InAs/InGaAs/InP quantum dots grown by metalorganic vapor-phase epitaxy (MOVPE) deposition using droplet epitaxy, which emits in the telecom C band. Using pump-probe Faraday ellipticity measurements, we determine electron and hole g factors of | g e | = 0.93 and | g h | = 0.47 , with the electron g factor being nearly twice as low as typical molecular beam epitaxy Stranski-Krastanov (SK) grown samples. Most significantly, we measure a longitudinal spin relaxation time T 1 = 3.0 µ s , representing an order of magnitude improvement over comparable MBE SK grown samples. Despite significant electron g -factor anisotropy, we observed that it is reduced relative to similar material composition samples grown with MBE or MOVPE SK methods. We attribute this g -factor anisotropy and spin lifetime improvements to the enhanced structural symmetry achieved via MOVPE droplet epitaxy, which mitigates the inherent structural asymmetry in strain-driven growth approaches for InAs/InP quantum dots. These results demonstrate that MOVPE droplet epitaxy-grown InAs/InGaAs/InP quantum dots exhibit favorable spin properties for potential implementation in quantum information applications.
Language: English
Open Access status: hybrid
OpenAlex ID: W4415009795
FWCI: 0.37
Cites: 61
Cited by: 1
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