Work

Nanoscale Dynamics of Buried Charge Trap in Oxide-Nitride-Oxide Stacks Investigated Using Kelvin Probe Force Microscopy

Year: 2025

Type: article

Source: Nano Letters

DOI: 10.1021/acs.nanolett.5c03652

Authors: Sungmin Yoon, Seokhoon Choi, Min-Hyun Lee, Sunho Kim, Seonghoon Jang, Hyunseong Park, Dooho Lee, Seung-Yeul Yang, Jeong Young Park

Institutions: Korea Advanced Institute of Science and Technology, Samsung (South Korea), Samsung Advanced Institute of Technology (South Korea)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Foundation of Korea

Awards: G1857922940, G3678570327

OpenAlex ID: W4415014363

FWCI:

Cites: 47

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