Work

Parametric curve-based representation of piecewise linear masks

Year: 2025

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.24.4.044401

Authors: Soobin Hwang, Pervaiz Kareem, Stefan De Gendt, Ryoung-Han Kim

Institutions: KU Leuven, IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4415032401

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