Investigation of TiN/LaO x Interface Dipole Effect on Negative Flat-Band Voltage ( V FB ) Shift in TiN/LaO x /HfO 2 /SiO 2 Gate Stacks Using Dipole-Last Technology
Year: 2025
Type: article
Authors: Yu Wang, Jiaxin Yao, Yanzhao Wei, Qingzhu Zhang, Nannan You, Shuai Yang, Huaxiang Yin
Institutions: Chinese Academy of Sciences, Institute of Microelectronics
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G6170109669, G6650429780
OpenAlex ID: W4415124335