Work

Growth and characterization of high-quality h-BN single-layer films on Si-incorporated Ni (111) via molecular beam epitaxy

Year: 2025

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0284316

Authors: Quazi Sanjid Mahmud, Yuan Li, Chengyun Shou, Tianchen Yang, Abdullah Almujtabi, Edward Zhu, Jianlin Liu

Institution: University of California, Riverside

Language: English

Topic: Boron and Carbon Nanomaterials Research

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

Award: MRI-R2: Acquisition of an X-ray photoelectron spectrometer (XPS)

OpenAlex ID: W4415153268

FWCI: 0.212

Cites: 51

Cited by: 1

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