Work

Growth Mechanism During Initial Stages of Molecular Layer Deposition of Polyurea

Year: 2025

Type: article

Source: Langmuir

DOI: 10.1021/acs.langmuir.5c03852

Authors: Wallis E. Scholl, Mingmei Wang, Thorsten Lill, Rachel A. Nye de Castro, Eric A. Hudson, Sumit Agarwal

Institutions: Colorado School of Mines, Lam Research (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Lam Research

OpenAlex ID: W4415166695

FWCI: 0.901

Cites: 31

Cited by: 4

Related to: