Plasma-enhanced atomic layer deposition of elemental niobium thin films
Year: 2025
Type: article
Source: Applied Physics Letters
DOI: 10.1063/5.0267694
Authors: Noel Arellano, Charles T. Rettner, Holt Bui, Khanh V. Nguyen, Philip Rice, Teya Topuria, Eugene Delenia, Anthony Fong, Ishwar Singh, Rudy Wojtecki
Institution: IBM Research - Almaden
Language: English
Subfield: Astronomy and Astrophysics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4415167323