Work

Artificial intelligence in atomic layer deposition

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004881

Authors: Pouyan Navabi, Remya Ampadi Ramachandran, Harshdeep Bhatia, Majid Jaberi-Douraki, Urmila Diwekar, Cortino Sukotjo, Christos G. Takoudis

Institutions: University of Illinois Chicago, Kansas State University, Vishwamitra Research Institute, University of Pittsburgh

Language: English

Topic: Machine Learning in Materials Science

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: University of Illinois at Chicago

OpenAlex ID: W4415245310

FWCI: 0.634

Cites: 58

Cited by: 3

Related to: