Work

Ab Initio Insights into the Reactivity of Precursors in Atomic Layer Deposition: A Case Study of GeAsSe

Year: 2025

Type: article

Source: The Journal of Physical Chemistry C

DOI: 10.1021/acs.jpcc.5c05127

Authors: Bram van der Linden, Geoffrey Pourtois, Laura Nyns, Sergiu Clima, Tobias Peissker, Annelies Delabie

Institutions: IMEC, KU Leuven

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Fonds Wetenschappelijk Onderzoek

Award: Atomic layer deposition of two-dimensional transition metal dichalcogenides and ovonic threshold switching materials: A new computational framework for precursor design

OpenAlex ID: W4415294395

FWCI: 0.231

Cites: 39

Cited by: 1

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