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Recent Advancements and Emerging Applications in Atomic Layer Deposition (ALD) on High-Porosity Materials

Year: 2024

Type: conference-paper

Source: HAL (Le Centre pour la Communication Scientifique Directe)

Author: Bechelany, Mikhael

Institution: Institut Européen des Membranes

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4415319262

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