Work

The Collaborative Application of High‐K Dielectric and Ultralow‐K Dielectric Materials in Folded Multilayer Graphene Nanoribbon Interconnect for Enhancing Electrical Performance

Year: 2025

Type: article

Source: International Journal of Circuit Theory and Applications

DOI: 10.1002/cta.70161

Authors: Huan Huang, Peng Xu, Zongjie Zeng, Qiang Liao, Fa Zou

Institutions: Guangdong Polytechnic Normal University, South China Normal University

Language: English

Topic: Graphene research and applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4415370288

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Cites: 47

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