Work

Mode optimization in a 1550 nm VCSEL based on mesa-dielectric film synergistic regulation

Year: 2025

Type: article

Source: Applied Optics

DOI: 10.1364/ao.576360

Authors: Xiaoyan Gao, Yinli Zhou, Jianwei Zhang, Chao Chen, Yumeng Pan, Zhuo Zhang, Tianjiao Liu, Gaohui Yuan, Tianqi Zhang, Yu Cao, Yongqiang Ning, Lijun Wang

Language: English

Topic: Semiconductor Lasers and Optical Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Chinese Academy of Sciences, National Key Research and Development Program of China

Awards: G1172350458, G1492989876, G2513732441, G4498761748, G6161267482, G7801803222, G8844632104

OpenAlex ID: W4415380221

FWCI:

Cites: 13

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