All‐Inorganic TiO 2 Nanoparticle‐Based Metalenses Manufactured by Direct Nanoimprint Lithography for High Energy Applications: Femtosecond Laser‐Induced Damage Threshold Testing
Year: 2025
Type: article
Source: Advanced Optical Materials
Institutions: University of Massachusetts Amherst, TU Wien
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4415506992
