Work

Norbornene and Epoxide-Substituted Silsesquioxane Photoresists with High-Sensitivity and Stability

Year: 2025

Type: article

Source: ACS Nano

DOI: 10.1021/acsnano.5c06472

Authors: Rui-Sheng Zhang, Li Miao, Xin-Yu Lu, Qiang Li, Feng Luo, Hua-Yu Qiu, Guang-Peng Wu

Institutions: Zhejiang University, Hangzhou Normal University, State Key Laboratory of Modern Optical Instruments, Nankai University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Key Research and Development Program of China, National Science Fund for Distinguished Young Scholars

Awards: G4239200822, G5175839734

OpenAlex ID: W4415612247

FWCI: 1.356

Cites: 38

Cited by: 6

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