Work

Design and analysis of a scanning magnetron for uniform planar sputtering onto rectangular substrates

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004799

Authors: Hong S. Yang, Zuoxing Li, Xinhua Zhu, Rongfeng Xiao, Lin Feng, Ting Li, Xiaobo Hu, Xiaojun Zhang

Institution: Arrayed Materials (China)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Shenzhen Science and Technology Innovation Program

Award: G7830546009

OpenAlex ID: W4415616987

FWCI:

Cites: 5

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