Work

The Effect of Crystallinity in HfO2 Thin Films Prepared by Evaporation for 1064 nm Absorption

Year: 2025

Type: article

Abstract: The optical absorption mechanism and the preparation technology for achieving low absorption of HfO2 thin films at 1064 nm were systematically investigated. Through molecular dynamics simulations and electron density of states calculations, it was determined that oxygen vacancies within the thin films significantly contributed to the absorption of 1064 nm light. HfO2 thin film samples were synthesized using various deposition parameters, followed by comprehensive measurement and analysis of their crystal phase, fluorescence, and microstructure. Theoretical calculations and experimental results indicated that the crystallization of amorphous films increased the presence of oxygen vacancy defects, consequently enhancing film absorption. Notably, following heat treatment at 400 °C, one sample retained a predominantly amorphous structure while exhibiting minimal absorption, suggesting improved optical stability for inertial confinement fusion and industrial laser processing applications.

Source: Coatings

DOI: 10.3390/coatings15111254

Authors: Peng Zeng, Yali Wu, Xinbo Bai, Zhongmin Cao, Ming Wei

Institutions: Southwest China Institute of Electronic Technology, Chongqing University of Posts and Telecommunications, Institute of Optics and Electronics, Chinese Academy of Sciences, University of Chinese Academy of Sciences

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $3,137

Funders: National Natural Science Foundation of China, Youth Innovation Promotion Association