Work

Electron scattering at Ru(0001) surfaces: Effect of Ti caps and oxygen exposure

Year: 2025

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0283448

Authors: Sadiq Shahriyar Nishat, Daniel Gall

Institution: Rensselaer Polytechnic Institute

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Semiconductor Research Corporation, Empire State Development's Division of Science, Technology and Innovation

Awards: Collaborative Research: FuSe: Interconnects with Co-Designed Materials, Topology, and Wire Architecture, G205447584, G229692529, G3609010113

OpenAlex ID: W4415810451

FWCI: 0.652

Cites: 45

Cited by: 4

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