Work

Helium assisted plasma etching of indium phosphide ridge waveguides at mild condition

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004862

Authors: Yue Zhang, Yuanwei Lin

Institution: NAURA (China)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G3933581431

OpenAlex ID: W4415868541

FWCI:

Cites: 40

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