Work

Effect of plasma parameters on the properties of V2O5 deposited by plasma-enhanced atomic layer deposition

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004718

Authors: P. M. Litwin, N. Nepal, M. G. Sales, D. R. Boris, M. J. Johnson, S. G. Walton, V. D. Wheeler

Institutions: United States Naval Research Laboratory, National Academy of Sciences, National Academies of Sciences, Engineering, and Medicine

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Academy of Sciences, U.S. Naval Research Laboratory

OpenAlex ID: W4415868609

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Cites: 22

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