Work

Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004800

Authors: Sen Wang, Quan-Zhi Zhang, Maksudbek Yusupov, You-Nian Wang

Institutions: Dalian University of Technology, Tashkent State Technical University named after Islam Karimov, Central Asian University, Tashkent Institute of Irrigation and Agricultural Mechanization Engineers

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G2257545783, G431998119

OpenAlex ID: W4415868734

FWCI: 0.227

Cites: 33

Cited by: 1

Related to: