Work

Synthesis and structural characterization of MAX phase thin films by radio frequency sputtering and annealing

Year: 2025
Type: article
Abstract: The family of MAX phase compounds has emerged as promising engineering materials with potential applications in various fields, including supercapacitors. Radio frequency sputtering, a low-temperature thin-film deposition process, allows for the precise deposition of Ti-Al-C multilayers. This study investigates the key steps in the formation of Ti 3 AlC 2 thin films on a copper substrate by converting Ti-Al-C multilayers as a function of annealing conditions. X-ray diffraction, scanning electron microscopy analysis, UV-visible spectroscopy, and FTIR spectroscopy provide structural insights. These findings provide significant insights into the development of binder-free and environmentally friendly anodes with copper current collectors. The versatility and performance of our approach make it a promising candidate for the growing demand in the supercapacitor and battery industries.
Institution: Alzahra University
Language: English
Open Access status: gold
Estimated APC paid: $2,690
OpenAlex ID: W4415885289
FWCI: 1.484
Cites: 43
Cited by: 7
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