Using Polymerization‐Induced Self‐Assembly in Orthogonally‐Reactive Dispersants to Design Tough Nanostructured Materials: Application to Epoxy Networks
Year: 2025
Type: article
Abstract: We report here how the polymerization-induced self-assembly approach can be implemented in orthogonally reactive dispersants to afford the preparation of nanostructured polymer networks. Precisely-defined PMMA-b-PLMA block copolymers self-assembling into different morphologies are first obtained in epoxy monomers through RAFT dispersion polymerization. The subsequent polymerization of the epoxide (through step growth or chain growth polymerization) affords the straightforward preparation of epoxy networks that integrate diverse BCP structures and exhibit significantly enhanced fracture toughness at extremely low block copolymer content (1% w/w).
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $5,510
Award: G6208913568
OpenAlex ID: W4416093729