Work

Growth dynamics in patterned TiO2 deposited by direct atomic layer processing (DALP) in ambient conditions

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004868

Authors: Simone Santucci, Amogh Kinikar, Ziwei Wang, Nandan Singh Ruhela, Jesper Navne, Masoud Akbari, Artem Mishchenko, Mira Baraket, Maksym Plakhotnyuk

Institutions: University of Manchester, Isfahan University of Technology

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4416144714

FWCI: 0.693

Cites: 51

Cited by: 3

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