Year: 2025
Type: article
Abstract: We present a novel approach for the optical activation of the negatively-charged silicon vacancy ( V Si − ) center in ion irradiated silicon carbide (SiC) via ns-pulsed laser annealing in the 234–2180 mJ cm − 2 energy density range. The laser annealing process is investigated under 355 nm and 532 nm wavelengths at pulse energy densities below the melting threshold and validated by means of Raman spectroscopy and photoluminescence mapping. The combined effect of ns pulsed laser annealing and subsequent thermal treatment is also assessed. The results offer a promising resource for the development of integrated photonic SiC devices and could be extended to a potentially wide range of applications involving other classes of solid-state quantum emitters.
Source: Scientific Reports
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $2,690
Funders: Compagnia di San Paolo, European Commission, Istituto Nazionale di Fisica Nucleare, Ministero dell'Università e della Ricerca, HORIZON EUROPE Framework Programme, Nuclear Physics, European Metrology Programme for Innovation and Research, HORIZON EUROPE Marie Sklodowska-Curie Actions, NextGenerationEU
OpenAlex ID: W4416149302
