Work

Interface Roughness Scattering Processes in Quantum wells in a Tilted Quantizing Magnetic Field

Year: 2025

Type: preprint

Abstract: Scattering processes by the interface roughness in a quantum well in a quantizing magnetic field are considered. An expression for the scattering rate is derived for a magnetic field tilted relative to the quantum well layers. By analyzing this expression, trends in the behavior of the scattering rate are established with variation in the magnetic field strength and orientation, the potential profile of the quantum well, and the interface roughness parameters.

Source: arXiv (Cornell University)

DOI: 10.48550/arxiv.2511.06771

Authors: Telenkov, M. P., Mityagin, Yu. A.

Institution: P.N. Lebedev Physical Institute of the Russian Academy of Sciences

Topic: Semiconductor Quantum Structures and Devices

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W4416158311

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