Work

Degradation of Polycrystalline Silicon Thin-Film Transistors Under AC Gate Off-State Stress With a DC Drain Voltage Bias

Year: 2025

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2025.3630166

Authors: Pengfei Liu, Yunyang Wang, Meng Zhang, Zhendong Jiang, Lu Lei, Lanrong Zou, Man Wong, Hoi-Sing Kwok

Institutions: Shenzhen University, Peking University, Hong Kong University of Science and Technology

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G3097323869

OpenAlex ID: W4416183074

FWCI: 0.451

Cites: 34

Cited by: 2

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