Work

Optimization of 3D Nanosheet Transistor Design for Advanced Technology Nodes Beyond 3nm

Year: 2025

Type: conference-paper

Source: IEEE Nanotechnology Materials and Devices Conference (NMDC)

DOI: 10.1109/nmdc64551.2025.11233998

Authors: Stephanie Y. Chang, Yulin Deng

Institution: Stanford University

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4416251012

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Cites: 5

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