Year: 2025
Type: article
Abstract: We developed a novel system that quickly predicts cross-sectional images from experimental conditions to minimize cross-sectional processing. This has become a bottleneck in observing pattern shapes of materials used in substrate manufacturing. This system can predict cross-sectional images from experimental conditions and propose process conditions to form the desired pattern shape. We consider that using this system will improve the development speed of overall semiconductor packages.
Source: IMAPSource Proceedings
DOI: 10.4071/001c.147292
Authors: Kohei Motojima, Hayato Sugiyama, Kaede Ameyama, Chiho Ueta
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W4416294019
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