Work

SiGe BiCMOS Process Design Kit for Cryogenic High-Frequency Applications

Year: 2025

Type: conference-paper

Source: IEEE International System-on-Chip Conference (SOCC)

DOI: 10.1109/socc66126.2025.11235485

Authors: A. Datsuk, A. Balashov, P. Ostrovskyy, M. Yazici, C. Wipf, F. Vater, G. Popken, T. Thönes, S. Selvam

Institutions: Leibniz Institute for High Performance Microelectronics, Fraunhofer Institute for Integrated Circuits

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4416342215

FWCI:

Cites: 7

Cited by:

Related to: