Degradation Mechanism of Perfluoroelastomer (FFKM) in the Acidic SC2 Solution of Semiconductor Radio Corporation of America (RCA) Cleaning
Year: 2025
Type: article
Abstract: The degradation behavior and mechanism of perfluoroelastomer (FFKM) in the acidic Standard Clean 2 (SC2) solutions were studied to facilitate their application in semiconductor Radio Corporation of America (RCA) cleaning processes. The results indicate significant degradation of the mechanical properties of FFKM in the SC2 solution, characterized by surface pitting and particle formation, accompanied by progressive destruction of the cross-linked network. FTIR and XPS analyses revealed that degradation primarily occurs in the Trialkyl isocyanurate (TAIC) cross structure, while the main chain and side groups remain stable. HCl-induced acid hydrolysis and H2O2-induced oxidation act synergistically to break down the cross-link structures. This degradation compromised the filler matrix interface, leading to filler release and a consequent progressive deterioration of the overall properties of FFKM. This work elucidates the degradation mechanism of the FFKM in acidic environments, providing a scientific basis for the reliable design and lifetime prediction of FFKM components in semiconductor wet processes.
Source: Polymers
Authors: Fandi Meng, Xiaolong Wen, Qishan Chen, Tao Zhang, Li Liu
Institution: Northeastern University
Language: English
Subfield: Polymers and Plastics
Field: Materials Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $3,258
Awards: G8795321354, G911442070
OpenAlex ID: W4416419339